EUV is the only technology that enables manufacturing of advanced, sub-7nm chips – essential for all the exciting new technologies we all hear about in the news every day, like AI, 5G, IoT, and next-gen computing. But a key bottleneck threatens this progress: proper light sources are missing, limiting the resolution and applicability of various manufacturing processes crucial for advancing chipmaking That’s where L2X comes in. We develop cutting-edge Extreme Ultraviolet (EUV) light sources enabling the next generation of semiconductor manufacturing.

Our first line of products provides tailored, high-brightness EUV sources for many applications including: wafer & mask inspection, wafer metrology, and R&D – enabling performance and precision that today’s chipmaking ecosystem critically lacks.